MRS Proceedings Chemical Aspects of Electronic Ceramics Processing: Volume 495

Description

The use of high-performance ceramic materials in electronics holds the potential for the development of a wide array of novel, high-value products. These include: ferroelectric ceramic capacitors for ferroelectric nonvolatile random access memory (FRAM); high-dielectric capacitors for dynamic random access memory (DRAM); low-dielectric aerogels and mesoporous materials; electro-optical materials for waveguides, filters and switches; electronic packaging and interconnects for microelectronics; and wide-bandgap materials for blue LEDs and high-temperature devices. The key to the application of any of these materials is the method of deposition (thin films) or fabrication (bulk). Chemical vapor deposition (CVD) continues to be an area of research together with new and improved precursors, delivery systems for low-vapor pressure precursors and improved processing and materials properties. Solution processing of films is also a central theme. Topics include: chemical vapor deposition of oxide ceramics; chemical vapor deposition of nonoxide ceramics; solution routes to ceramic materials; characterization and application of ceramic materials and novel processing of ceramic materials -process characterization.

Details

Author(s)
Aloysius F. Hepp, David B. Beach, Prashant N. Kumta, John J. Sullivan, Barry Arkles
Format
Paperback | 488 pages
Dimensions
152 x 229 x 25mm | 650g
Publication date
05 Jun 2014
Publisher
CAMBRIDGE UNIVERSITY PRESS
Publication City/Country
Cambridge, United Kingdom
Language
English
Illustrations note
black & white illustrations
ISBN10
1107413508
ISBN13
9781107413504